China reportedly completes and tests a prototype EUV (Extreme Ultraviolet) chip-making machine in Shenzhen, signaling a major shift in the global
semiconductor race.
In a high-security Shenzhen laboratory, Chinese scientists have achieved what Washington spent years trying to prevent and what Europe's leading chip equipment maker said was impossible: building a working prototype of an extreme ultraviolet (EUV) lithography machine, dubbed “China’s Manhattan Project,” capable of producing the cutting-edge semiconductor chips that power artificial intelligence, smartphones, and advanced weapons systems. The breakthrough, as reported by Reuters, could prove ASML's CEO dramatically underestimated China's semiconductor capabilities.
[media=https://youtu.be/CHSK_C6_vgc]
In a high-security Shenzhen laboratory, Chinese scientists have achieved what Washington spent years trying to prevent and what Europe's leading chip equipment maker said was impossible: building a working prototype of an extreme ultraviolet (EUV) lithography machine, dubbed “China’s Manhattan Project,” capable of producing the cutting-edge semiconductor chips that power artificial intelligence, smartphones, and advanced weapons systems. The breakthrough, as reported by Reuters, could prove ASML's CEO dramatically underestimated China's semiconductor capabilities.
[media=https://youtu.be/CHSK_C6_vgc]
